表面活性剂胶束形状随浓度转变的核磁共振研究

运用核磁共振一维氢谱和自扩散实验方法研究了聚乙烯乙二醇异辛酚醚(TX-100)、十二烷基苯磺酸钠(SDBS)和十四烷基三甲基溴化铵(TTAB)三种不同类型的表面活性剂在重水溶液中的胶束形状转变, 发现它们在临界胶束浓度以上的各自相应浓度都有胶束形状的变化(由球状转变为椭球状或棒状). 在常温常压和没有其他添加剂的情况下, 表面活性剂溶液浓度高于其临界胶束浓度时, 球状胶束开始形成. 核磁共振一维氢谱和自扩散实验的结果显示, 当溶液浓度继续增加到一定程度时, 溶液中表面活性剂分子的化学位移和自扩散系数的变化速率都有明显的转折, 这说明溶液中球状胶束开始发生转变. 进一步通过仔细分析对比核磁共振一维氢谱中各基团谱峰, 发现表面活性剂胶束亲水表面上的质子的化学位移变化速率要远高于其疏水内核中的质子, 据此推测胶束形状很可能由球状转变为椭球状或棒状.     

双酚-F不饱和液晶化合物的合成与表征

以4,4'-二羟基二苯基甲烷(双酚-F),3-溴1-丙烯(或6-溴1-己烯)为原料合成了p-BAMBP,p-MBPAB和p-MBPHB三种新型含有不同长度不饱和末端基的液晶化合物,并用POM﹑FTIR、1H-NMR、DSC和XRD进行了表征.结果表明它们均为近晶型液晶,且熔点随柔性末端基增长而降低,相转变温度范围变宽.此类化合物有望作为新型液晶化合物或设计新型液晶功能高分子材料使用.     

胞外高钾对大鼠背根神经元超极化电流的影响

应用全细胞膜片钳技术研究了胞外高钾对大鼠背根神经元（DRG）超极化电流（Ih）的影响．结果表明,Ih随着胞外钾离子浓度的增大而增大,同时随着外加刺激电压的增高而增强．当胞外钾离子浓度[Kext]为4,8和16mmol／L时,半数激活电压V1/2分别为-98±1．9,-106±1．3（p〈0．05）和-110±1．0mV（p〈0．05）,其对应的最大电流的峰值分别为1085±340,1576±409和2124±614pA,与4mmol／L比较,后者分别增长了45％和92％．胞外高钾使,Ih激活曲线显著左移,说明高Kext改变了超极化电流的激活过程．提高细胞外钾离子浓度,可以使早期钾通道（又称快通道）的激活时间常数增大,使晚期钾通道（又称慢通道）激活时间常数减小．当胞外钾离子浓度由4mmol／L升高到8和16mmol／L时,翻转电位右移,但不具有显著性差异．结果提示,细胞外高浓度钾可增强大鼠背根神经元超极化电流,Ih,改变Ih的激活过程,从而提高了神经元的兴奋性,产生不正常的动作电位,对神经细胞产生损伤．     

Recent results for single meson production from the Crystal-Barrel/TAPS experiment at ELSA

The present focus of the CBELSA/TAPS experiment is on meson-photoproduction off the nucleon using polarized photons and polarized targets. Here first preliminary results on the reactions γp → pπ and γp → pπ for both circularly and linearly polarized photons and a longitudinally polarized target are presented. Preliminary results for the beam asymmetry ∑ and the double polarization observable G have been extracted for both reactions using the linear polarization data. From the circular polarization data the observable E has been determined. Due to the near 4π angular coverage of the detector system these results cover almost the full solid angle.     

Theoretical Analysis of Interference Nanolithography of Surface Plasmon Polaritons without a Match Layer

Interference nanolithography techniques based on long-range surface plasmon polaritons （LR-SPP） are hardly ever achieved by experiments at present. One key reason is that suitable liquid materials are difflcult to find as the match layer connects the metal film and the resist. We redesign a Kretschmann-Raether structure for interference lithography. A polymer layer is coated under the metal film, and an air layer is placed between the polymer layer and the resist layer. This design not only avoids the above-mentioned question of the match layer, but also can form a soft contact between the polymer layer and the resist layer and can protect the exposure pattern. Simulation results confirm that a device with an appropriately thick polymer layer can form high intensity and contrast interference fringes with a critical dimension of about λ/7 in the resist. In addition, the fabrication of the device is very easy.     

《光谱学与光谱分析》投稿简则

《光谱学与光谱分析》是由中国科协主管，中国光学学会主办，钢铁研究总院、中国科学院物理研究所、北京大学、清华大学共同承办的专业学术期刊。国内外公开发行，从2004年起为月刊，大16开本，2009年仍为月刊，每期288页。《光谱学与光谱分析》主要报道我国光谱学与光谱分析领域内具有创新性科研成果，及时反映国内外光谱学与光谱分析的进展和动态；发现并培育人才；推动和促进光谱学与光谱分析的发展。为科教兴国服务。读者对象为从事光谱学与光谱分析的科研人员、教学人员、分析测试人员和科研管理干部。